Title

Selective area laser induced deposition of metal borides

Author

Veronica K. Holmes, Southern University and A&M College
Z. C. Zhong, University of Nebraska - Lincoln
P A. Dowben, University of Nebraska - Lincoln

Date of Award

Spring 5-1999

Document Type

Thesis

Degree Name

Honors College Theses

Department

Chemistry

Second Advisor

Dr. Joyce W. O'Rourke

Third Advisor

Dr. Beverly Wade

Abstract

A novel technique, laser-induced solution deposition (LISD), has been developed for the selective area deposition of rare earth hexaborides. This technique was simple and efficient and combined advantages of chemical vapor deposition (CVD) and electrolytic deposition. The deposition of polycrystalline thin films of hexaborides and sub-borides, such as MB_6, MB_4, and MB₂ (M = Gd, La), occurred by the light-initiated chemical reaction of nido-decaborane (B₁₀H₁₄) and rare earth chlorides in solution. These films grew with a strongly textured axis and had a morphology that was dependent on solvents and irradiation wavelength. Deposition of transition metals also occurred with the photolysis of organometallic complexes adsorbed on solid surfaces. Results of a more conventional chemical vapor deposition process were compared with those from the LISD process.

Comments

This work, conducted during the Summer 1998 Research Experiences for Undergraduates Program in Nanostructured Materials at the University of Nebraska, was supported by the National Science Foundation. This work was funded by Dale Electronics of Columbus, Nebraska, the National Science Foundation (NSF grant No. ORS-9255225) and Center for Materials Research and Analysis.

Recommended Citation

Holmes, Veronica K.; Zhong, Z. C.; and Dowben, P A., "Selective area laser induced deposition of metal borides" (1999). Electronic Dissertations and Theses. 36.
https://digitalcommons.subr.edu/dissertations_theses/36